Silicon technologies [electronic resource] : ion implantation and thermal treatment / edited by Annie Baudrant.

Contributor(s): Material type: TextTextPublication details: London : ISTE ; Hoboken, N.J. : Wiley, 2011.Description: xvii, 337 p. : illSubject(s): Genre/Form: DDC classification:
  • 621.3815/2 22
LOC classification:
  • TK7871.85 .S5485 2011eb
Online resources: Summary: The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
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Includes bibliographical references and index.

The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

Electronic reproduction. Palo Alto, Calif. : ebrary, 2015. Available via World Wide Web. Access may be limited to ebrary affiliated libraries.

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