Atomic layer deposition
Kaariainen, Tommi.
Atomic layer deposition principles, characteristics, and nanotechnology applications / [electronic resource] : Tommi Kaariainen ... [et al.]. - 2nd ed. - Hoboken, NJ : John Wiley & Sons, c2013. - xv, 253 p. : ill.
Includes bibliographical references and index.
Electronic reproduction.
Palo Alto, Calif. :
ebrary,
2013.
Available via World Wide Web.
Access may be limited to ebrary affiliated libraries.
Chemical vapor deposition.
Epitaxy.
Microelectronics.
Nanotechnology.
Electronic books.
TS695 / .K33 2013eb
620/.5
Atomic layer deposition principles, characteristics, and nanotechnology applications / [electronic resource] : Tommi Kaariainen ... [et al.]. - 2nd ed. - Hoboken, NJ : John Wiley & Sons, c2013. - xv, 253 p. : ill.
Includes bibliographical references and index.
Electronic reproduction.
Palo Alto, Calif. :
ebrary,
2013.
Available via World Wide Web.
Access may be limited to ebrary affiliated libraries.
Chemical vapor deposition.
Epitaxy.
Microelectronics.
Nanotechnology.
Electronic books.
TS695 / .K33 2013eb
620/.5