Tan, Cher Ming,  1959- <br/><br/>
Electromigration in ULSI interconnections  [electronic resource] / 
Cher Ming Tan. 
 - Hackensack, N.J. :  World Scientific,  c2010. 
 - xix, 291 p. :  ill. (some col.), col. port. 
 - International series on advances in solid state electronics and technology (ASSET) .
 - International series on advances in solid state electronics and technology. .
<br/><br/>Includes bibliographical references and index. 
<br/><br/><br/>Electronic reproduction. <br/>Palo Alto, Calif. : <br/>ebrary, <br/>2013. <br/>Available via World Wide Web. <br/>Access may be limited to ebrary affiliated libraries. 
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<br/><br/><label>Subjects--Topical Terms: </label><br/>Integrated circuits--Ultra large scale integration.<br/>Electrodiffusion.
<br/><br/><label>Index Terms--Genre/Form: </label><br/>Electronic books.
<br/><br/><label>LC Class. No.: </label>TK7874.76  / .T36 2010eb