TY  - BOOK
AU  - Baudrant,Annie
ED  - ebrary, Inc.
TI  - Silicon technologies: ion implantation and thermal treatment 
AV  - TK7871.85 .S5485 2011eb
U1  - 621.3815/2 22
PY  - 2011///
CY  - London, Hoboken, N.J.
PB  - ISTE, Wiley
KW  - Semiconductor doping
KW  - Ion implantation
KW  - Semiconductors
KW  - Heat treatment
KW  - Electronic books
KW  - local
N1  - Includes bibliographical references and index; Electronic reproduction; Palo Alto, Calif.; ebrary; 2015; Available via World Wide Web; Access may be limited to ebrary affiliated libraries
N2  - The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion
UR  - http://site.ebrary.com/lib/daystar/Doc?id=10660607
ER  -