Kaariainen, Tommi. <br/><br/>
Atomic layer deposition  principles, characteristics, and nanotechnology applications /  [electronic resource] : 
Tommi Kaariainen ... [et al.]. 
 - 2nd ed. 
 - Hoboken, NJ :  John Wiley & Sons,  c2013. 
 - xv, 253 p. :  ill. 
<br/><br/>Includes bibliographical references and index. 
<br/><br/><br/>Electronic reproduction. <br/>Palo Alto, Calif. : <br/>ebrary, <br/>2013. <br/>Available via World Wide Web. <br/>Access may be limited to ebrary affiliated libraries. 
<br/><br/><label>ISBN: </label>
<br/><br/><label>LCCN: </label>
<br/><br/><label>Subjects--Topical Terms: </label><br/>Chemical vapor deposition.<br/>Epitaxy.<br/>Microelectronics.<br/>Nanotechnology.
<br/><br/><label>Index Terms--Genre/Form: </label><br/>Electronic books.
<br/><br/><label>LC Class. No.: </label>TS695  / .K33 2013eb 
<br/><br/><label>Dewey Class. No.: </label>620/.5