000			01813nam a2200361 a 4500
001			0000165804
005			20171002063305.0
006			m u
007			cr cn|||||||||
008			101013s2011 enka sb 001 0 eng d
010			_z 2010040731
020			_z9781848212022 (hardback)
020			_z184821202X (hardback)
020			_z9781118621233 (e-book)
035			_a(CaPaEBR)ebr10671590
035			_a(OCoLC)842854719
040			_aCaPaEBR _cCaPaEBR
050	1	4	_aTK7872.M3 _bL58 2011eb
082	0	4	_a621.3815/31 _222
245	0	0	_aLithography _h[electronic resource] : _bmain techniques / _cedited by Stefan Landis.
260			_aLondon : _bISTE ; _aHoboken, N.J. : _bWiley, _c2011.
300			_axxv, 377 p. : _bill. (some col.)
500			_aAdapted and updated from Lithography published 2010 in France by Hermes Science/Lavoisier.
504			_aIncludes bibliographical references and index.
520			_a"Lithography is now a complex tool at the heart of a technological process for manufacturing micro and nanocomponents. A multidisciplinary technology, lithography continues to push the limits of optics, chemistry, mechanics, micro and nano-fluids, etc. This book deals with essential technologies and processes, primarily used in industrial manufacturing of microprocessors and other electronic components"-- _cProvided by publisher.
533			_aElectronic reproduction. _bPalo Alto, Calif. : _cebrary, _d2013. _nAvailable via World Wide Web. _nAccess may be limited to ebrary affiliated libraries.
650		0	_aMicrolithography.
655		7	_aElectronic books. _2local
700	1		_aLandis, Stefan.
710	2		_aebrary, Inc.
856	4	0	_uhttp://site.ebrary.com/lib/daystar/Doc?id=10671590 _zAn electronic book accessible through the World Wide Web; click to view
908			_a170314
942	0	0	_cEB
999			_c154950 _d154950